Citation:
Wang J, Wang M, Wang P, Wei J, Wang J, Pei X, Sun N, Ye J, Zhang X, Feng Y, et al. Enhanced Gate Reliability and High Threshold Voltage p-GaN HEMT With p-NiO/p-GaN Heterojunction, in 2026 IEEE 38th International Symposium on Power Semiconductor Devices and ICs (ISPSD).; 2026:625-628.
