Citation:Li Y-Y, Wang G, Zhu X-G, Liu M-H, Ye C, Chen X, Wang Y-Y, He K, Wang L-L, Ma X-C, et al. Intrinsic topological insulator Bi 2 Te 3 thin films on si and their thickness limit. Advanced Materials [Internet]. 2010;(36):4002-4007.ExportDOI BibTex EndNote Tagged EndNote XML Website DOI