<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>47</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Huang, Zifeng</style></author><author><style face="normal" font="default" size="100%">Kaiqi Yang</style></author><author><style face="normal" font="default" size="100%">Yiyun He</style></author><author><style face="normal" font="default" size="100%">Zuoyuan Dong</style></author><author><style face="normal" font="default" size="100%">Sun, Zixuan</style></author><author><style face="normal" font="default" size="100%">Xiyuan TANG</style></author><author><style face="normal" font="default" size="100%">Ming Li</style></author><author><style face="normal" font="default" size="100%">Runsheng WANG</style></author><author><style face="normal" font="default" size="100%">Cheng, Zhe</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">First Demonstration of Three-Dimensional Thermal Conductivity Distribution Measurements of Interconnect Stacks Down to 3 nm Process Nodes</style></title><secondary-title><style face="normal" font="default" size="100%">IEEE IEDM</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2025</style></year></dates><language><style face="normal" font="default" size="100%">eng</style></language></record></records></xml>