<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Xu, M.</style></author><author><style face="normal" font="default" size="100%">Wu, Y. Q.</style></author><author><style face="normal" font="default" size="100%">Koybasi, O.</style></author><author><style face="normal" font="default" size="100%">Shen, T.</style></author><author><style face="normal" font="default" size="100%">Ye, P. D.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Metal-oxide-semiconductor field-effect transistors on GaAs (111)A surface with atomic-layer-deposited Al2O3 as gate dielectrics</style></title><secondary-title><style face="normal" font="default" size="100%">Applied Physics Letters</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2009</style></year></dates><urls><web-urls><url><style face="normal" font="default" size="100%">&amp;lt;Go to ISI&amp;gt;://WOS:000266500400022</style></url></web-urls></urls><number><style face="normal" font="default" size="100%">21</style></number><volume><style face="normal" font="default" size="100%">94</style></volume><language><style face="normal" font="default" size="100%">eng</style></language><work-type><style face="normal" font="default" size="100%">Journal Article</style></work-type><custom7><style face="normal" font="default" size="100%">000266500400022</style></custom7></record></records></xml>