<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>6</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Wu, Y. Q.</style></author><author><style face="normal" font="default" size="100%">Wang, R. S.</style></author><author><style face="normal" font="default" size="100%">Shen, T.</style></author><author><style face="normal" font="default" size="100%">Gu, J. J.</style></author><author><style face="normal" font="default" size="100%">Ye, P. D.</style></author><author><style face="normal" font="default" size="100%">Ieee</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">First Experimental Demonstration of 100 nm Inversion-mode In GaAs FinFET through Damage-free Sidewall Etching</style></title><secondary-title><style face="normal" font="default" size="100%">2009 Ieee International Electron Devices Meeting</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2009</style></year></dates><urls><web-urls><url><style face="normal" font="default" size="100%">&amp;lt;Go to ISI&amp;gt;://WOS:000279343900076</style></url></web-urls></urls><pages><style face="normal" font="default" size="100%">304-+</style></pages><isbn><style face="normal" font="default" size="100%">978-1-4244-5639-0</style></isbn><language><style face="normal" font="default" size="100%">eng</style></language><work-type><style face="normal" font="default" size="100%">Book</style></work-type></record></records></xml>