<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>6</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Dong, L.</style></author><author><style face="normal" font="default" size="100%">Liu, Y. Q.</style></author><author><style face="normal" font="default" size="100%">Xu, M.</style></author><author><style face="normal" font="default" size="100%">Wu, Y. Q.</style></author><author><style face="normal" font="default" size="100%">Colby, R.</style></author><author><style face="normal" font="default" size="100%">Stach, E. A.</style></author><author><style face="normal" font="default" size="100%">Droopad, R.</style></author><author><style face="normal" font="default" size="100%">Gordon, R. G.</style></author><author><style face="normal" font="default" size="100%">Ye, P. D.</style></author><author><style face="normal" font="default" size="100%">Ieee</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Atomic-layer-deposited LaAlO3/SrTiO3 all oxide field-effect transistors</style></title><secondary-title><style face="normal" font="default" size="100%">2010 International Electron Devices Meeting - Technical Digest</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2010</style></year></dates><urls><web-urls><url><style face="normal" font="default" size="100%">&amp;lt;Go to ISI&amp;gt;://WOS:000287997300151</style></url></web-urls></urls><isbn><style face="normal" font="default" size="100%">978-1-4244-7419-6</style></isbn><language><style face="normal" font="default" size="100%">eng</style></language><work-type><style face="normal" font="default" size="100%">Book</style></work-type></record></records></xml>