@inbook {RN65,
	title = {ALD High-k as a Common Gate Stack Solution for Nano-electronics},
	booktitle = {Dielectrics for Nanosystems 4: Materials Science, Processing, Reliability, and Manufacturing},
	series = {ECS Transactions},
	volume = {28},
	year = {2010},
	pages = {51-+},
	type = {Book Section},
	isbn = {978-1-60768-142-7},
	doi = {10.1149/1.3372563},
	url = {\&lt;Go to ISI\&gt;://WOS:000313250400004},
	author = {Ye, P. D. and Gu, J. J. and Wu, Y. Q. and Xu, M. and Xuan, Y. and Shen, T. and Neal, A. T.},
	editor = {Misra, D. and Z. Chen and Iwai, H. and Bauza, D. and Chikyow, T. and Obeng, Y.}
}
