<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Na Zhang</style></author><author><style face="normal" font="default" size="100%">Xu, Fujun</style></author><author><style face="normal" font="default" size="100%">Jing Lang</style></author><author><style face="normal" font="default" size="100%">Liubing Wang</style></author><author><style face="normal" font="default" size="100%">Wang, Jiaming</style></author><author><style face="normal" font="default" size="100%">Baiyin Liu</style></author><author><style face="normal" font="default" size="100%">Xuzhou Fang</style></author><author><style face="normal" font="default" size="100%">Yang, Xuelin</style></author><author><style face="normal" font="default" size="100%">Xiangning Kang</style></author><author><style face="normal" font="default" size="100%">Wang, Xinqiang</style></author><author><style face="normal" font="default" size="100%">Qin, Zhixin</style></author><author><style face="normal" font="default" size="100%">Ge, Weikun</style></author><author><style face="normal" font="default" size="100%">Shen, Bo</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Improved Ohmic contacts to plasma etched high Al fraction n-AlGaN by active surface pretreatment</style></title><secondary-title><style face="normal" font="default" size="100%">Applied Physics Letters</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2021</style></year></dates><volume><style face="normal" font="default" size="100%">118</style></volume><pages><style face="normal" font="default" size="100%">222101</style></pages><language><style face="normal" font="default" size="100%">eng</style></language></record></records></xml>