@article {39875,
	title = {Improved Ohmic contacts to plasma etched high Al fraction n-AlGaN by active surface pretreatment},
	journal = {Applied Physics Letters},
	volume = {118},
	year = {2021},
	pages = {222101},
	author = {Na Zhang and Xu, Fujun and Jing Lang and Liubing Wang and Wang, Jiaming and Baiyin Liu and Xuzhou Fang and Yang, Xuelin and Xiangning Kang and Wang, Xinqiang and Qin, Zhixin and Ge, Weikun and Shen, Bo}
}
