<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Wang, Jinbing</style></author><author><style face="normal" font="default" size="100%">Wang, Maojun</style></author><author><style face="normal" font="default" size="100%">Wang, Pengfei</style></author><author><style face="normal" font="default" size="100%">Wei, Jin</style></author><author><style face="normal" font="default" size="100%">Wang, Jinyan</style></author><author><style face="normal" font="default" size="100%">Zhang, Xun</style></author><author><style face="normal" font="default" size="100%">Feng, Yuxia</style></author><author><style face="normal" font="default" size="100%">Sun, Na</style></author><author><style face="normal" font="default" size="100%">Pei, Xinyi</style></author><author><style face="normal" font="default" size="100%">Ye, Jiandong</style></author><author><style face="normal" font="default" size="100%">Chen, Kevin J.</style></author><author><style face="normal" font="default" size="100%">Yang, Han</style></author><author><style face="normal" font="default" size="100%">Shen, Bo</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Enhancement-mode GaN p-FET with p-NiO/p-GaN heterojunction gate featuring improved threshold voltage stability and channel conductivity based on low interface trap density</style></title><secondary-title><style face="normal" font="default" size="100%">Applied Physics Letters</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2026</style></year><pub-dates><date><style  face="normal" font="default" size="100%">04</style></date></pub-dates></dates><urls><web-urls><url><style face="normal" font="default" size="100%">https://doi.org/10.1063/5.0315801</style></url></web-urls></urls><number><style face="normal" font="default" size="100%">17</style></number><volume><style face="normal" font="default" size="100%">128</style></volume><pages><style face="normal" font="default" size="100%">173505</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">Enhancement-mode (E-mode) p-channel field-effect transistors (p-FETs) remain challenging for GaN complementary logic (CL) technology due to their unstable threshold voltage (Vth), low current density, and large on-resistance (RON) at 6 V CL-compatible operation. In this work, we demonstrate a high-performance E-mode GaN p-FET with a p-NiO/p-GaN heterojunction gate. Notably, the suppressed Vth shift and improved channel conductivity were simultaneously achieved in the E-mode channel. The improvement is primarily due to the type-II band alignment at the p-NiO/p-GaN interface. This structure reduces band overlap, resulting in a low interface trap density (DT) of 3.29–5.71 × 1010 cm−2 eV−1 as measured by the sub-bandgap photo-assisted capacitance–voltage method. The fabricated device with LG/LGS/LGD = 1.5/3/3 μm exhibits a Vth of −0.6 V with a minimal hysteresis of 0.02 V and maximum shift of 0.04 V under stress, a ID of 5.5 mA/mm, a RON of 0.47 k Ω mm, and a transconductance (gm) of 1.8 mS/mm for 6 V CL-compatible operation.</style></abstract></record></records></xml>