@conference {11040722,
	title = {Comprehensive Investigation of the Disturb and Retention Issues in Scaled FeNAND Arrays},
	booktitle = {2025 9th IEEE Electron Devices Technology \&amp; Manufacturing Conference (EDTM)},
	year = {2025},
	pages = {01-03},
	keywords = {Couplings, Degradation, disturb issues, Electric fields, FeFETs, FeNAND array, Logic gates, Optimization, Parallel processing, retention degradation, Systematics, Three-dimensional displays, Transistors},
	doi = {10.1109/EDTM61175.2025.11040722},
	author = {Zhou, Yuejia and Ru HUANG and Tang, Kechao}
}
