@article {https://doi.org/10.1002/adfm.202214653,
	title = {Symmetric and Excellent Scaling Behavior in Ultrathin n- and p-Type Gate-All-Around InAs Nanowire Transistors},
	journal = {Advanced Functional Materials},
	volume = {n/a},
	number = {n/a},
	year = {2023},
	pages = {2214653},
	abstract = {Abstract Complementary metal-oxide-semiconductor (CMOS) field-effect transistors (FETs) are the key component of a chip. Bulk indium arsenide (InAs) owns nearly 30 times higher electron mobility {\textmu}e than silicon but suffers from a much lower hole mobility {\textmu}h ({\textmu}e/{\textmu}h\&nbsp;= 80), thus unsuited to CMOS application with a single material. Through the accurate ab initio quantum-transport simulations, the performance gap between the NMOS and PMOS is significantly narrowed is predicted and even vanished in the sub-2-nm-diameter gate-all-around (GAA) InAs nanowires (NW) FETs because the inversion of the light and heavy hole bands occurs when the diameter is shorter than 3 nm. It is further proposed several feasible strategies for further improving the performance symmetry in the GAA InAs NWFETs. Short-channel effects are effectively depressed in the symmetric n- and p-type GAA InAs NWFETs till the gate length is scaled down to 2 nm according to the standards of the International Technology Roadmap for Semiconductors. Therefore, the ultrasmall GAA InAs NWFETs possess tremendous prospects in CMOS integrated circuits.},
	keywords = {gate-all-around transistors, quantum transport simulations, strain engineering, symmetric scaling behaviors, ultrathin InAs nanowires},
	doi = {https://doi.org/10.1002/adfm.202214653},
	url = {https://onlinelibrary.wiley.com/doi/abs/10.1002/adfm.202214653},
	author = {Li, Qiuhui and Yang, Chen and Xu, Lin and Liu, Shiqi and Fang, Shibo and Xu, Linqiang and Jie Yang and Ma, Jiachen and Ying Li and Wu, Baochun and Quhe, Ruge and Tang, Kechao and Jing Lu}
}
