<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>10</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Jack Hellerstedt</style></author><author><style face="normal" font="default" size="100%">J.H. Chen</style></author><author><style face="normal" font="default" size="100%">Dohun Kim</style></author><author><style face="normal" font="default" size="100%">William G. Cullen</style></author><author><style face="normal" font="default" size="100%">C.X. Zheng</style></author><author><style face="normal" font="default" size="100%">Michael S. Fuhrer</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">In situ monitoring of resistivity and carrier concentration during molecular beam epitaxy of topological insulator Bi2Se3</style></title><secondary-title><style face="normal" font="default" size="100%">Proceedings of SPIE - The International Society for Optical Engineering</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2013</style></year></dates><language><style face="normal" font="default" size="100%">eng</style></language><custom7><style face="normal" font="default" size="100%">000333057400018</style></custom7></record></records></xml>