@proceedings {8057,
	title = {In situ monitoring of resistivity and carrier concentration during molecular beam epitaxy of topological insulator Bi2Se3},
	journal = {Proceedings of SPIE - The International Society for Optical Engineering},
	year = {2013},
	doi = {10.1117/12.2033659},
	author = {Jack Hellerstedt and J.H. Chen and Dohun Kim and William G. Cullen and C.X. Zheng and Michael S. Fuhrer}
}
