@article {xu2011influence,
	title = {Influence of Radial Stress on the Performance of Gate-All-Around Ge (110) NW FETs with HfO2 Dielectric},
	journal = {Journal of Nanoscience and Nanotechnology},
	volume = {11},
	number = {12},
	year = {2011},
	pages = {10530{\textendash}10534},
	publisher = {American Scientific Publishers},
	author = {Xu, Honghua and Liu, Xiaoyan and Gang DU and He, Yuhui and Chun Fan and Han, Ruqi and Kang, Jinfeng}
}
