<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Biao Wu</style></author><author><style face="normal" font="default" size="100%">Philip I. Cohen</style></author><author><style face="normal" font="default" size="100%">L.C. Feldman</style></author><author><style face="normal" font="default" size="100%">Zhenyu Zhang</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Controlling film growth with selective excitation: Chemical vapor deposition growth of silicon</style></title><secondary-title><style face="normal" font="default" size="100%">Applied Physics Letters</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2004</style></year></dates><pages><style face="normal" font="default" size="100%">2175-2177</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><issue><style face="normal" font="default" size="100%">12</style></issue><custom7><style face="normal" font="default" size="100%">000220268500055</style></custom7></record></records></xml>